Chemical Vapor Deposition Growth of Graphene on Copper Substrates
- Area of Honors:
- Bachelor of Science
- Document Type:
- Thesis Supervisors:
- Dr Ying Liu, Thesis Supervisor
- Richard Wallace Robinett, Honors Advisor
- chemical vapor deposition
- Raman spectroscopy.
- This project involved the growth of graphene on copper substrates via chemical vapor deposition, or CVD. The system worked by flowing hydrogen and methane gases into a high temperature furnace with copper substrates inside it. At high temperatures, the methane gas dissociated and deposited graphene on the surface of the copper substrates. Growth of single, double, triple, and quadruple layer graphene was confirmed using Raman spectroscopy. Included in this report are details about the construction of the CVD system, the preparation of the copper substrates, the growth procedures, the Raman confirmation of graphene on copper, and the Raman confirmation of graphene that was layer-transferred onto silicon substrates.