The Characterization Of Silane Fragments In An Argon Matrix Using Matrix Isolation Infrared Spectroscopy
Open Access
Author:
Huffman, Bruce Phillips
Area of Honors:
Chemistry (Behrend)
Degree:
Bachelor of Science
Document Type:
Thesis
Thesis Supervisors:
Jay Charles Amicangelo, Thesis Supervisor Jason Alan Bennett, Thesis Honors Advisor
Keywords:
Chemistry Matrix Isolation
Abstract:
Performing matrix isolation vacuum ultraviolet photolysis and microwave discharge experiments on samples of SiH4 in an Ar matrix at 12 K produced the reactive transient molecules SiH and SiH2. Infrared spectroscopy of these intermediates showed absorption bands at 1953.6 cm-1 for SiH and 1997.6, 1992.8, 1973.2, 1964.4 cm-1, 1008.4 cm-1, and 994.8 cm-1 for SiH2. Analagous experiments with SiD4 produced absorption peaks at 1443.8, 1438.9, and 1436.9 cm-1 attributed to SiD2 and at 1420.5 cm-1 attributed to SiD. These observations show that these species were produced by VUV photolysis of SiH4 in an argon matrix. It was also observed that a microwave discharge energy source produces a significantly smaller amount of these species than a hydrogen resonance lamp energy source based on the relative intensities of the peaks observed in each experiment.
